DEVICE FOR WAFER INSPECTION

摘要

The invention relates to a device for wafer inspection. Said device comprises an incident light illumination element having an illumination axis and an imaging element having an imaging axis, both elements being inclined towards each other and oriented towards a region of the surface of the wafer, which is to be inspected. An imaging plane is defined by the illumination axis and the imaging axis by means of the bright field illumination adjustment of the device. The device is characterised in that the illumination axis rotated out of the imaging plane about a dark field angle gamma > 0 is arranged in such a way that a dark field illumination is present in the region to be inspected.