发明名称 |
Plasma generating apparatus using microwave |
摘要 |
The present invention uses as a detector for adjustment measurement, monodyne interference between a microwave for plasma generation and the reflected wave. Analysis of the interference wave that is obtained using monodyne interference allows finding of the phase difference between the incident and the reflected wave and the amplitude of that reflected wave; and controlling of an excited microwave generation/control system based on them allows impedance matching between the excited microwave and the plasma. This method allows very high precision phase detection, and calculation of the characteristics of the plasma based on the detected phase shift. Therefore, it is possible to distinguish noises even in the vicinity of the matched region.
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申请公布号 |
US6881922(B2) |
申请公布日期 |
2005.04.19 |
申请号 |
US20030432372 |
申请日期 |
2003.11.05 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY CORPORATION |
发明人 |
NISHIDA YASUSHI;ITO HIROAKI;YUGAMI NOBORU |
分类号 |
H05H1/00;H01J37/32;H05H1/46;(IPC1-7):B23K10/00 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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