发明名称 |
Disturbance-free, recipe-controlled plasma processing method |
摘要 |
A plasma processing control system and method which can suppress influences caused by disturbances. The control system includes a plasma processor for performing processing operation over a sample accommodated within a vacuum processing chamber, a sensor for monitoring process parameters during processing operation of the plasma processor, a processed-result estimation model for estimating a processed result on the basis of a monitored output of the sensor and a preset processed-result prediction equation, and an optimum recipe calculation model for calculating correction values of processing conditions on the basis of an estimated result of the processed-result estimation model in such a manner that the processed result becomes a target value. The plasma processor is controlled on the basis of a recipe generated by the optimum recipe calculation model.
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申请公布号 |
US6881352(B2) |
申请公布日期 |
2005.04.19 |
申请号 |
US20030350061 |
申请日期 |
2003.01.24 |
申请人 |
HITACHI, LTD. |
发明人 |
KAGOSHIMA AKIRA;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;MASUDA TOSHIO;KITSUNAI HIROYUKI;TANAKA JUNICHI;MORIOKA NATSUYO;TAMAKI KENJI |
分类号 |
H05H1/00;B01J19/08;H01J37/32;H01L21/302;H01L21/3065;H01L21/66;(IPC1-7):H01L21/00 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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