发明名称 Hybrid magnetic/electrostatic deflector for ion implantation systems
摘要 A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination.
申请公布号 US6881966(B2) 申请公布日期 2005.04.19
申请号 US20030461702 申请日期 2003.06.13
申请人 AXCELIS TECHNOLOGIES, INC. 发明人 BENVENISTE VICTOR M.;RATHMELL ROBERT D.;HUANG YONGZHANG
分类号 H01J27/18;H01J37/00;H01J37/05;H01J37/147;H01J37/30;H01J37/317;(IPC1-7):H01J37/30 主分类号 H01J27/18
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