EUV LITHOGRAPHIC PROJECTION APPARATUS COMPRISING AN OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, OPTICAL ELEMENT WITH A SELF-ASSEMBLED MONOLAYER, METHOD OF APPLYING A SELF-ASSEMBLED MONOLAYER, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

An EUV lithographic apparatus contains an optical element, the surface of the optical element being modified to reduce the effects of reflectivity reduction by molecular contamination. The surface is modified such that it includes a self assembled monolayer.