发明名称 Metrology process for enhancing image contrast
摘要 A metrology process for increasing image contrast of a buried feature, comprising milling a selected surface of a substrate to expose a cross section of the buried feature; exposing the exposed cross section with a gas mixture, wherein the gas mixture comprises a flourine bearing compound; and irradiating the exposed cross section with a high energy beam to increase image contrast of the buried feature.
申请公布号 US6881955(B2) 申请公布日期 2005.04.19
申请号 US20030604110 申请日期 2003.06.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LU WEI;PETRUS JOHN CHARLES
分类号 G01N23/225;G01N1/28;G01N1/32;G01N23/22;H01J37/20;H01J37/317;(IPC1-7):G01N23/225 主分类号 G01N23/225
代理机构 代理人
主权项
地址