发明名称 |
Metrology process for enhancing image contrast |
摘要 |
A metrology process for increasing image contrast of a buried feature, comprising milling a selected surface of a substrate to expose a cross section of the buried feature; exposing the exposed cross section with a gas mixture, wherein the gas mixture comprises a flourine bearing compound; and irradiating the exposed cross section with a high energy beam to increase image contrast of the buried feature.
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申请公布号 |
US6881955(B2) |
申请公布日期 |
2005.04.19 |
申请号 |
US20030604110 |
申请日期 |
2003.06.26 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LU WEI;PETRUS JOHN CHARLES |
分类号 |
G01N23/225;G01N1/28;G01N1/32;G01N23/22;H01J37/20;H01J37/317;(IPC1-7):G01N23/225 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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