发明名称 SEMICONDUCTOR DEVICE
摘要 <p>Latch-up of each of parasitic thyristors (T1-T4), which occurs when a circuit element (B1) is formed on a semiconductor substrate in which an IGBT (Z1) has been formed, is prevented by a circuit for preventing the latch-up using Schottky barrier diodes (D2, D3) formed on the semiconductor substrate. Each of the Schottky barrier diodes (D2, D3), which is composed of a junction between a diffused layer used for forming the circuit element and a metal wiring layer, is used in the circuit for preventing the latch-up action of each of the parasitic thyristors (T1-T4). Thereby, the area of the semiconductor device can be made smaller while the semiconductor device can have a higher protection effect.</p>
申请公布号 KR100483671(B1) 申请公布日期 2005.04.18
申请号 KR20010011326 申请日期 2001.03.06
申请人 发明人
分类号 H01L27/092;H01L21/822;H01L21/8238;H01L27/02;H01L27/04;H01L27/06;H01L29/47;H01L29/739;H01L29/78;H01L29/872;(IPC1-7):H01L27/092 主分类号 H01L27/092
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