SPUTTERING TARGET, SINTERED BODY, CONDUCTIVE FILM FORMED BY USING THEM, ORGANIC EL DEVICE, AND SUBSTRATE USED FOR THE ORGANIC EL DEVICE

摘要

A sintered body containing at least one kind of indium oxide, zinc oxide, and tin oxide and further containing at least one kind of hafnium oxide, tantalum oxide, lanthanide oxide, and bismuth oxide is prepared. A backing plate is attached to the sintered body to form a sputtering target. A conductive film is formed on a predetermined substrate by sputtering using this sputtering target. While maintaining the transparency of the conductive film at the same level as the conventional ones, a great work function is realized. Using this conductive film realizes an EL device having an improved hole injection efficiency.