| 摘要 |
Disclosed is a method for manufacturing an electrical contact element used to test an electronic device, and an electrical contact element manufactured thereby. The electrical contact element is manufactured by defining, on a sacrificial substrate, a trench in which a tip portion is to be formed, forming a protective film pattern such that the protective film pattern delimits an opened region in which a beam portion is to be formed and which is communicated with the trench, filling a conductive material into the opened region, and removing the sacrificial substrate and the protective film pattern to form the electrical contact element having the tip portion and the beam portion. The method comprises the step of conducting one or more times, after defining the trench, anisotropic etching in the trench in such a way as to increase a depth of the trench and round an inner surface of the trench. The electrical contact element comprises a beam portion having a multi-stepped configuration which comprises a first bar-shaped part, a second bar-shaped part connected with the first part and having a width greater than the first part, and a third bar-shaped part connected at one thereof with the second part and having a width greater than the second part, the third part being connected at the other end thereof with an electronic component, through a bump; and a tip portion formed integrally with a free end of the first part of the beam portion. |
