Method of forming isolation film of semiconductor device,申请号KR20020085460-传众专利搜索

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发明名称	Method of forming isolation film of semiconductor device
摘要
申请公布号	KR100481920(B1)	申请公布日期	2005.04.14
申请号	KR20020085460	申请日期	2002.12.27
申请人		发明人
分类号	H01L21/762;H01L21/306;H01L21/3063;H01L21/316;(IPC1-7):H01L21/762	主分类号	H01L21/762
代理机构		代理人
主权项
地址

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