发明名称 FERROELECTRIC THIN FILM AND ITS PRODUCING PROCESS, FERROELECTRIC MEMORY, PIEZOELECTRIC ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a ferroelectric thin film having good hysteresis characteristics applicable to a ferroelectric capacitor, 1T1C, 2T2C type ferroelectric memory consisting of a select CMOS transistor, and simple matrix type ferroelectric memory, and the like. <P>SOLUTION: In a ferroelectric Pb(Zr, Ti)O<SB>3</SB>where the A site ion of a ferroelectric perovskite material contains at least 4 coordination Si<SP>4+</SP>or Ge<SP>4+</SP>by 1% or more, reliability is enhanced significantly by adding at least one kind of Nb, V and W to B site by total 5-40 mol%. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101491(A) 申请公布日期 2005.04.14
申请号 JP20040005297 申请日期 2004.01.13
申请人 SEIKO EPSON CORP 发明人 KIJIMA TAKESHI;MIYAZAWA HIROSHI;HAMADA YASUAKI;NATORI EIJI
分类号 B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;C04B35/00;C04B35/46;C04B35/462;C04B35/49;C23C18/12;C23C30/00;C30B5/00;C30B29/30;C30B29/32;H01L21/316;H01L21/336;H01L21/8246;H01L21/8247;H01L27/105;H01L27/115;H01L29/788;H01L29/792;H01L41/08;H01L41/09;H01L41/187;H01L41/318;H01L41/39 主分类号 B41J2/045
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