发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
申请公布号 US2005078287(A1) 申请公布日期 2005.04.14
申请号 US20040924202 申请日期 2004.08.24
申请人 ASML NETHERLANDS B.V. 发明人 SENGERS TIMOTHEUS FRANCISCUS;VAN DE KERKHOF MARCUS ADRIANUS;KROON MARK;VAN WEERT KEES
分类号 G01B15/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/52 主分类号 G01B15/00
代理机构 代理人
主权项
地址