发明名称 IMPROVED METHOD FOR MICRO-ROUGHENING TREATMENT OF COPPER AND MIXED-METAL CIRCUITRY
摘要 Process to improve adhesion of dielectric materials to a metal layer, including providing an unpatterned metal layer having a first major surface; micro-roughening the first major surface to form a micro-roughened surface; and etching the metal layer to form a circuit pattern in the metal layer, in which the micro-roughening is carried out prior to the etching.
申请公布号 WO2005034596(A2) 申请公布日期 2005.04.14
申请号 WO2004US31697 申请日期 2004.09.27
申请人 ATOTECH DEUTSCHLAND GMBH;FUERHAUPTER, HARRY;BARON, DAVID, THOMAS;JOHAL, KULDIP, SINGH;BROOKS, PATRICK, PAUL 发明人 FUERHAUPTER, HARRY;BARON, DAVID, THOMAS;JOHAL, KULDIP, SINGH;BROOKS, PATRICK, PAUL
分类号 C23F1/18;H05K3/02;H05K3/06;H05K3/38;H05K3/46;(IPC1-7):H05K3/00 主分类号 C23F1/18
代理机构 代理人
主权项
地址