Method and Apparatus FOR Cleaning A Semiconductor Substrate,申请号KR20030007903-传众专利搜索

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发明名称	Method and Apparatus FOR Cleaning A Semiconductor Substrate
摘要
申请公布号	KR100483429(B1)	申请公布日期	2005.04.14
申请号	KR20030007903	申请日期	2003.02.07
申请人		发明人
分类号	H01L21/304;B08B7/00;C25F1/00;G03F7/42;H01L21/00;H01L21/02;H01L21/302;H01L21/311;H01L21/3213;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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