发明名称 APPARATUS FOR INSPECTING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To reduce the space and the costs required for inspecting a substrate, especially a semiconductor wafer, during a production process. SOLUTION: The apparatus has inspection machines including a means for holding a probe board that includes, at least, a chuck, a chuck drive, an electronics control device, a probe or handling system 3, a substrate magazine station 7, and an alignment station 10. The apparatus has at least two inspection machines 1, 2, which are all jointly operatively connected to the handling system, the substrate magazine station, and the alignment station. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101584(A) 申请公布日期 2005.04.14
申请号 JP20040249234 申请日期 2004.08.27
申请人 SUSS MICROTEC TEST SYSTEMS GMBH 发明人 SCHNEIDEWIND STEFAN;DIETRICH CLAUS;WERNER FRANK-MICHAEL;FEUERSTEIN DON;LANCASTER MIKE;PLACE DENIS
分类号 H01L21/66;G01R31/02;H01L21/00;H05K3/00;(IPC1-7):H01L21/66 主分类号 H01L21/66
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