摘要 |
A method and system are provided for monitoring status of a system component in a process chamber of a batch type processing system. The method includes exposing a system component to light from a light source and monitoring interaction of the light with the system component to determine status of the system component. The method can detect light transmission and/or light reflection from a system component during a process that can include a chamber cleaning process, a chamber conditioning process, a substrate etching process, and a substrate film formation process. The system component can be a consumable system part such as a process tube, a shield, a ring, a baffle, and a liner, and can further contain a protective coating. |
申请人 |
TOKYO ELECTRON LIMITED;O'MEARA, DAVID, L.;BURDETT, DANIEL, CRAIG;CABRAL, STEPHEN, H.;LEUSINK, GERT;KOSTENKO, JOHN, WILLIAM;WAJDA, CORY |
发明人 |
O'MEARA, DAVID, L.;BURDETT, DANIEL, CRAIG;CABRAL, STEPHEN, H.;LEUSINK, GERT;KOSTENKO, JOHN, WILLIAM;WAJDA, CORY |