发明名称 METHOD FOR MONITORING STATUS OF SYSTEM COMPONENTS
摘要 A method and system are provided for monitoring status of a system component in a process chamber of a batch type processing system. The method includes exposing a system component to light from a light source and monitoring interaction of the light with the system component to determine status of the system component. The method can detect light transmission and/or light reflection from a system component during a process that can include a chamber cleaning process, a chamber conditioning process, a substrate etching process, and a substrate film formation process. The system component can be a consumable system part such as a process tube, a shield, a ring, a baffle, and a liner, and can further contain a protective coating.
申请公布号 WO2005034181(A2) 申请公布日期 2005.04.14
申请号 WO2004US28802 申请日期 2004.09.21
申请人 TOKYO ELECTRON LIMITED;O'MEARA, DAVID, L.;BURDETT, DANIEL, CRAIG;CABRAL, STEPHEN, H.;LEUSINK, GERT;KOSTENKO, JOHN, WILLIAM;WAJDA, CORY 发明人 O'MEARA, DAVID, L.;BURDETT, DANIEL, CRAIG;CABRAL, STEPHEN, H.;LEUSINK, GERT;KOSTENKO, JOHN, WILLIAM;WAJDA, CORY
分类号 G01N21/55;G01N21/59 主分类号 G01N21/55
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