| 发明名称 |
A METHOD AND SYSTEM FOR CONTROLLING THE CHEMICAL MECHANICAL POLISHING BY USING A SENSOR SIGNAL OF A PAD CONDITIONER |
| 摘要 |
<p>In a system and a method, according to the present invention, a sensor signal, such as a motor current signal, from a drive assembly of a pad conditioning system is used to control a CMP system to compensate for a change in the conditions of consumables, thereby enhancing process stability.</p> |
| 申请公布号 |
WO2005032763(A1) |
申请公布日期 |
2005.04.14 |
| 申请号 |
WO2004US30410 |
申请日期 |
2004.09.17 |
| 申请人 |
ADVANCED MICRO DEVICES, INC.;MARXSEN, GERD;KRAMER, JENS;STOECKGEN, UWE, GUNTER |
发明人 |
MARXSEN, GERD;KRAMER, JENS;STOECKGEN, UWE, GUNTER |
| 分类号 |
B24B7/04;B24B37/04;(IPC1-7):B24B37/00;B24B53/02 |
主分类号 |
B24B7/04 |
| 代理机构 |
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