| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device that has a local transporting area and satisfactorily processes a substrate without receiving any influence of chemical contamination. SOLUTION: A chemical filter unit 70a is provided immediately above a main transporting area 48 near the outer upper part 81a of a developing block 4, and another chemical filter unit 70b is provided immediately above the local transporting area 49 near the outer upper part 81b of the developing block 4. Therefore, the down blows of clean air is formed even in the local transporting area 49 in addition to the main transporting area 48. Consequently, the substrate treating device satisfactorily processes the substrate without receiving the influence of chemical contamination even when the substrate W carried in a heating section PHP is moved vertically in the local transporting area 49. COPYRIGHT: (C)2005,JPO&NCIPI |
