METHOD OF CLEANING MEMBER AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To clean members in a depressurized processing chamber by dispersing particulates from surfaces of the members. SOLUTION: In order to clean the members in the depressurized processing chamber by dispersing the particulates sticking to the members, one or a combination of the following means are used; (1) a means for dispersing the particulates utilizing Maxwell stress by applying voltages to the members; (2) a means for dispersing the particulates utilizing a Coulomb force by charging the particulates; (3) a means for dispersing the particulates by introducing gas into the depressurized processing chamber to make a gas impulse wave arrive at the members on which the particulates are stuck; (4) a means for dispersing the particulates utilizing thermal stresse and a thermophoresis force by raising the temperature of the members; or (5) a means for dispersing the particulates by giving mechanical vibration to the members. Furthermore, the dispersed particulates are removed by moving them by a gas stream utilizing a relatively high-pressure atmosphere. COPYRIGHT: (C)2005,JPO&NCIPI