发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To make a laser beam irradiation using a material different with a prior mask and construction for selective irradiation with the laser beam using the laser beam having a laser beam output power over a wide range. SOLUTION: The invention is to form the mask which reflects the laser beam and to irradiate selectively the laser beam. The mask is made of a laminated film that is a laminate of at least a first material and a second material. An amorphous semiconductor film, the first material, and the second material are stacked in this order for irradiation with the laser beam from one side of a substrate, where the refractive index of the first material is n1, the refractive index of the second material is n2, and n1<n2 is met. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101553(A) 申请公布日期 2005.04.14
申请号 JP20040235740 申请日期 2004.08.13
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 SHIMOMURA AKIHISA;HAMADA TAKASHI
分类号 H05B33/10;H01L21/20;H01L21/336;H01L29/786;H01L51/50;H05B33/14;(IPC1-7):H01L21/336 主分类号 H05B33/10
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