| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which can keep a wide process window in the process of forming an isolated groove (trench) pattern and a dense trench pattern, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The positive resist composition contains: (A) a resin having a specified repeating unit having a norbornane lactone structure and having the solubility with an alkaline developing solution increased by the effect of an acid; (B) a compound which generates specified sulfonic acid by irradiation of active rays or radiation; and (C) solvent. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
