发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing semiconductor device by which the manufacturing cost of a semiconductor device is reduced by far improving utilizing efficiency of a use liquid material by using a simple process, and, at the same time, a metallic plug is formed surely in a contact hole. SOLUTION: The method of manufacturing the semiconductor device includes: a step ST1 of forming an insulating film having the contact hole on a first conductive film; a liquid repellent area forming step ST2 of forming a patterned liquid repellent film on the surface of the insulating film; and a liquid material arranging step ST3 of selectively arranging the liquid material in the contact hole. The method also includes a drying step ST4 of obtaining the metallic plug by solidifying the liquid material arranged in the contact hole by drying and baking the material, and a liquid repellent film removing step ST5 of removing the liquid repellent film. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101556(A) 申请公布日期 2005.04.14
申请号 JP20040237561 申请日期 2004.08.17
申请人 SEIKO EPSON CORP 发明人 SATO MITSURU;YUDASAKA KAZUO
分类号 G02F1/136;H01L21/02;H01L21/288;H01L21/336;H01L21/768;H01L29/786;H01L51/50;H05B33/14;(IPC1-7):H01L21/288 主分类号 G02F1/136
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