THIN FILM DEPOSITING METHOD, AND SUBSTRATE HOLDING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a thin film depositing method and a substrate holding device capable of uniformly heating a substrate and suppressing damages of a substrate surface. SOLUTION: The thin film depositing method for depositing a thin film on one main surfaces of a substrate 5 comprises a step of holding the substrate 5 with a predetermined space from a susceptor 1, and a film deposition step of depositing a thin film on one main surfaces of the substrate 5 with the substrate 5 heated via the susceptor 1. The substrate holding device 10 for heating and holding the substrate 5 comprises a heating body 2 to heat the substrate 5, the susceptor 1 disposed between the substrate 5 and the heating body 2, and a spacer 6 to hold the substrate 5 with a predetermined space from the susceptor 1. COPYRIGHT: (C)2005,JPO&NCIPI