PLASMA PROCESSING APPARATUS, METHOD FOR PRODUCING REACTION VESSEL FOR PLASMA GENERATION, AND PLASMA PROCESSING METHOD

摘要

A plasma processing apparatus is disclosed which is capable of processing a large area at a time and is excellent in process uniformity. This apparatus comprises a pair of electrode plates having through holes and an insulating plate having through holes. The insulating plate is so arranged between the electrode plates that positions of through holes of the electrode plates agree with those of the insulating plate. Consequently, a plurality of discharge spaces are formed by the through holes of the electrodes plates and the through holes of the insulating plate. By supplying a plasma-forming gas into the discharge spaces and applying a voltage between the electrode plates, plasmas are produced in the discharge spaces at the same time. By spraying the thus-produced plasmas to an object to be processed, there can be efficiently conducted a large-area plasma processing.