Fabricating method of semiconductor device,申请号KR20020080216-传众专利搜索

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发明名称	Fabricating method of semiconductor device
摘要
申请公布号	KR100482180(B1)	申请公布日期	2005.04.14
申请号	KR20020080216	申请日期	2002.12.16
申请人		发明人
分类号	H01L21/28;H01L21/768;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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