发明名称
摘要 A process of making a product which comprises at least two layers in contact with each other, each layer being of a wide-gap material and each layer differing from each other in at least one property, includes the steps of: (i) providing a substrate of a wide-band gap material having a surface and a region adjacent the surface having a particular characteristic, (ii) ion implanting the substrate through the surface to form a damaged layer below that surface, (iii) growing a layer of a wide-band gap material by chemical vapour deposition on at least a portion of the surface of the substrate through which ion implantation occurred, the material of the grown layer having a characteristic different to that of the region of the substrate adjacent the surface through which ion implantation occurred, and (iv) severing the substrate through the damaged layer. The wide-gap material is preferably diamond.
申请公布号 JP2005510056(A) 申请公布日期 2005.04.14
申请号 JP20030544801 申请日期 2002.11.12
申请人 发明人
分类号 C23C14/48;C23C14/58;C23C16/01;C30B33/00;H01L21/04;H01L21/20;H01L21/265 主分类号 C23C14/48
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