发明名称 PRODUCTION METHOD FOR HARDLY CHARGED GLASS SUBSTRATE, AND HARDLY CHARGED GLASS SUBSTRATE OBTAINED THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a hardly charged glass substrate, and the substrate obtained thereby. SOLUTION: The method comprises placing a glass substrate G in an atmospheric pressure plasma-generating device in which a treatment object is treated by an atmospheric pressure plasma generated between a high-voltage electrode 1 and a low-voltage electrode 2, and making the substrate G hardly charged by the generated atmospheric pressure plasma. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005097018(A) 申请公布日期 2005.04.14
申请号 JP20030330327 申请日期 2003.09.22
申请人 AIR WATER INC 发明人 ITO SHIGEKI;AIDA SHINJI;KITANO KENZO
分类号 B01J19/08;C03C4/00;C03C23/00;(IPC1-7):C03C23/00 主分类号 B01J19/08
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