发明名称 |
PRODUCTION METHOD FOR HARDLY CHARGED GLASS SUBSTRATE, AND HARDLY CHARGED GLASS SUBSTRATE OBTAINED THEREBY |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a hardly charged glass substrate, and the substrate obtained thereby. SOLUTION: The method comprises placing a glass substrate G in an atmospheric pressure plasma-generating device in which a treatment object is treated by an atmospheric pressure plasma generated between a high-voltage electrode 1 and a low-voltage electrode 2, and making the substrate G hardly charged by the generated atmospheric pressure plasma. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005097018(A) |
申请公布日期 |
2005.04.14 |
申请号 |
JP20030330327 |
申请日期 |
2003.09.22 |
申请人 |
AIR WATER INC |
发明人 |
ITO SHIGEKI;AIDA SHINJI;KITANO KENZO |
分类号 |
B01J19/08;C03C4/00;C03C23/00;(IPC1-7):C03C23/00 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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