| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for determining direction of a substrate concerning a patterning method, especially a method for determining it with quick rotation without requiring a special mark on the substrate. SOLUTION: At least two structures (S1) and (S2) that are on the substrate (2) and have corresponding formations mutually, for example, previously projected pattern image that is formed on known measured position in measuring coordinates system (u-v axes) of a lithography device and the pattern after the rotation, are used for determining the direction of the substrate. Metrical vector (Tx) between these at least two structures (S1) and (S2) is determined. Rotation angle (Rz) of pattern coordinates system (x-y axes) relating to the substrate from the measuring coordinates system is calculated. COPYRIGHT: (C)2005,JPO&NCIPI |
