| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which functions as a protective film which is formed using a lithographic means and is used at etching, a doping or the like, and provide a fabricating process of a semiconductor device which has a high safety, employs an easy-to-handle substance as a resist stripper, and is considered for an environment. <P>SOLUTION: The resist composition includes a water-soluble homopolymer, water or a solvent which is compatible with water and in which the water-soluble homopolymer is dissolved. The fabricating method of the semiconductor device includes a process to remove with water the protection film formed by discharging the resist composition using the lithographic means, after use. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
