EXPOSING METHOD, AND ALIGNMENT METHOD FOR SUBSTRATE USED FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an exposing method in which a substrate can properly and inexpensively be positioned by a method using an alignment mark whatever arrangement style a pattern formed on the substrate takes.

SOLUTION: An alignment position where the mask-side alignment mark 42 of a photomask 40 and a substrate-side alignment mark 57 relating to respective BM layer pattern areas 51 to 56 of the substrate 50 match each other in an XY plane and an exposure position where the color filter pixel part 41 of the photomask 40 and the BM layer pattern areas 51 to 56 of the substrate 50 match each other are separated from each other in an X direction by a specified shift quantity. Then, primary alignment between the photomask 40 and substrate 50 is performed at the alignment position and then the substrate 50 is moved from the alignment position to the exposure position by X-directional stepped movement to finally be positioned at the exposure position.

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