发明名称 FILM-FORMING APPARATUS AND MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a vapor-deposited article, which has an evaporation source capable of stably evaporating a material for a long period, and shows a superior throughput. SOLUTION: The evaporation source in a vapor deposition apparatus has an actuator for moving a crucible up and down. When a vapor-depositing material is plugged in the opening of the crucible, the actuator moves a crucible down into the inner part of the evaporation source, and encloses it therein. Then, the vapor-depositing material having plugged the opening is efficiently heated by a heater to vaporize because of such an efficient structure in the evaporating source as to heat the opening, which eliminates the plugging. Afterwards, the actuator moves a crucible upward, and the vapor deposition apparatus performs vapor deposition while heating the crucible. Thereby, the vapor deposition apparatus can perform film formation for a long period of time without opening the inner part to the atmosphere, and improves the productivity in producing an organic electroluminescence element. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005097730(A) 申请公布日期 2005.04.14
申请号 JP20040235763 申请日期 2004.08.13
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 OHARA HIROKI
分类号 H05B33/10;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):C23C14/24 主分类号 H05B33/10
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