发明名称 |
Novel polymer, positive resist composition, and patterning process using the same |
摘要 |
There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin. There can be provided a positive resist composition having high sensitivity and high resolution on exposure to a high energy beam, wherein line edge roughness is reduced since swelling at the time of development is suppressed, and the residue after development is little.
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申请公布号 |
US2005079440(A1) |
申请公布日期 |
2005.04.14 |
申请号 |
US20040945397 |
申请日期 |
2004.09.21 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;HARADA YUJI;KAWAI YOSHIO |
分类号 |
C08F220/18;C08F220/24;C08F220/28;G03C1/76;G03F7/004;G03F7/039;(IPC1-7):G03C1/76 |
主分类号 |
C08F220/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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