发明名称 VACUUM PROCESSING DEVICE AND TRANSPORTATION METHOD OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide vacuum processing and a vacuum processing method that realize a high production efficiency. SOLUTION: The vacuum processing device comprises: a cassette stage 2 which keeps a substrate in a cassette 1 to be placed in a horizontal state; a first transportation device 13 arranged to access a plurality of cassettes 1 on the cassette stage 2 and a substrate receiving chamber 5 or a substrate taking-out chamber 6; a transportation chamber 16 configured for connection to a plurality of peripheral vacuum process chambers 11 along with the substrate receiving chamber 5 and the substrate taking-out chamber 6; and a second transportation device arranged to access all of the substrate receiving chamber 5 and the substrate taking-out chamber 6 provided in the transportation chamber 16, and of the plurality of vacuum process chambers 11. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005101625(A) 申请公布日期 2005.04.14
申请号 JP20040302409 申请日期 2004.10.18
申请人 HITACHI LTD 发明人 KATO SHIGEKAZU;NISHIHATA KOJI;TSUBONE TSUNEHIKO;ITO ATSUSHI
分类号 B65G49/07;C23C16/44;H01L21/205;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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