发明名称 |
VACUUM PROCESSING DEVICE AND TRANSPORTATION METHOD OF SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide vacuum processing and a vacuum processing method that realize a high production efficiency. SOLUTION: The vacuum processing device comprises: a cassette stage 2 which keeps a substrate in a cassette 1 to be placed in a horizontal state; a first transportation device 13 arranged to access a plurality of cassettes 1 on the cassette stage 2 and a substrate receiving chamber 5 or a substrate taking-out chamber 6; a transportation chamber 16 configured for connection to a plurality of peripheral vacuum process chambers 11 along with the substrate receiving chamber 5 and the substrate taking-out chamber 6; and a second transportation device arranged to access all of the substrate receiving chamber 5 and the substrate taking-out chamber 6 provided in the transportation chamber 16, and of the plurality of vacuum process chambers 11. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005101625(A) |
申请公布日期 |
2005.04.14 |
申请号 |
JP20040302409 |
申请日期 |
2004.10.18 |
申请人 |
HITACHI LTD |
发明人 |
KATO SHIGEKAZU;NISHIHATA KOJI;TSUBONE TSUNEHIKO;ITO ATSUSHI |
分类号 |
B65G49/07;C23C16/44;H01L21/205;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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