发明名称 |
Developing method, substrate treating method, and substrate treating apparatus |
摘要 |
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.
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申请公布号 |
US2005079639(A1) |
申请公布日期 |
2005.04.14 |
申请号 |
US20040968992 |
申请日期 |
2004.10.21 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
ITOH MASAMITSU;YONEDA IKUO;SAKURAI HIDEAKI |
分类号 |
G03F7/30;H01L21/027;H01L21/304;(IPC1-7):H01L21/66 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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