发明名称 DEPOSITION AND PATTERNING PROCESS
摘要 A method for applying particles in a pattern to a substrate, either directly or by use of an intermediate tool, by electrokinetic or electrostatic means. A method for applying metal particles such as solder metal in a pattern to an electronic device substrate, either directly or by use of an intermediate tool, by electrokinetic or electrostatic means.
申请公布号 WO2005033352(A2) 申请公布日期 2005.04.14
申请号 WO2004US22143 申请日期 2004.07.09
申请人 FRY'S METALS INC.;LEWIS, BRIAN, G.;SINGH, BAWA;DETIG, ROBERT, H.;MINOGUE, GERARD;EBERLEIN, DIETMAR, C.;REILLY, KENNETH;MARCZI, MICHAEL 发明人 LEWIS, BRIAN, G.;SINGH, BAWA;DETIG, ROBERT, H.;MINOGUE, GERARD;EBERLEIN, DIETMAR, C.;REILLY, KENNETH;MARCZI, MICHAEL
分类号 B01J19/08;B05D1/06;B05D1/32;B23K3/06;C23C;H01L21/288;H01L21/48;H01L21/60;H05K3/34 主分类号 B01J19/08
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