发明名称 |
Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure |
摘要 |
A method of dividing a circuit pattern for creating complementary stencil masks corresponding to complementary patterns, the method comprising a step of dividing a circuit pattern into a plurality of complementary patterns including a first complementary pattern comprising a pattern of a cantilevered beam member having a support portion width W1 and a length L1, and a second complementary pattern comprising a pattern of a both end-supported beam member having a support portion width W2 and a length L2. The dividing of the circuit pattern is performed in a manner that a aspect ratio A1 (L1/W1) of the pattern of the cantilevered beam member is confined to not more than 100, and that a aspect ratio A2 (L2/W2) of the pattern of the both end-supported beam member is confined to not more than 150. |
申请公布号 |
US2005079426(A1) |
申请公布日期 |
2005.04.14 |
申请号 |
US20040948154 |
申请日期 |
2004.09.24 |
申请人 |
TOPPAN PRINTING CO., LTD. |
发明人 |
EGUCHI HIDEYUKI;YOSHII TAKASHI;SUGIMURA HIROSHI;TAMURA AKIRA |
分类号 |
G03F1/16;G03F1/20;(IPC1-7):G03F9/00;G03C5/00;G06F17/50 |
主分类号 |
G03F1/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|