APPARATUS FOR MANUFACTURING SEMICONDUCTOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR

摘要

An apparatus of manufacturing a semiconductor and a manufacturing method thereof are provided to perform rapidly a gas substitution process by supplying a purge gas between a control valve and a process chamber. A plurality of control valves(V1-V4) are installed in front of a process chamber. A purge gas main path(50) is used for supplying a purge gas. A plurality of purge gas sub-paths(51) are branched from the purge gas main path and are connected between the control valves and the process chamber. An orifice is installed at each of the purge gas sub-paths in order to determine a mass flow rate by a pressure of a primary side when a pressure of a primary side to a pressure of a secondary side is more than a predetermined value. A plurality of mass flow controllers(19,52) are installed at the purge gas main path in order to control a total mass flow rate of the purge gas sub-paths.