| 摘要 |
<p>PROBLEM TO BE SOLVED: To reproduce a high aspect ratio absorber pattern with good reproducibility over a large exposure area by fixing the absorber to a transmit ting material composed of resin. SOLUTION: An absorber pattern 3 is fixed on a transmitting film 2 composed of a polyimide resin. The polyimide resin layer is, for example, a 3 &mu m thickness film which flatly adheres to a supporting frame 4 composed of a strong metal by applying tensile force. Since the film is being pulled, the thermal expansion coefficient of the X-ray mask 1 is decided by the material of the supporting frame 4. In this example, the width of the bottom part is 5 &mu m, the space is 10 &mu m and the thickness is 15 &mu m. The thickness of the polyimide resin 2 is 3-5 &mu m, and the Au absorber pattern is adhered with an organic agent. Since the thickness of the polyimide resin 2, which is the transmitting material, is 3 &mu m, while that of the Au absorber pattern 3 is 15 &mu m, sufficient mask contrast can be obtained for exposure with an X-ray wavelength of approximately 0.2-0.8 nm. With this structure, an X-ray mask 1 having a large exposure area with a diameter of 300 mm is obtained.</p> |
