发明名称 Pattern formation method and substrate manufacturing apparatus
摘要 A pattern formation method for discharging a prescribed fluid onto a substrate form an ink-jet head and forming an arbitrary pattern. The method including the steps of discharging the fluid onto the substrate from an ink jet head and defining a pattern-forming region by subjecting the substrate to a specific treatment to prevent the fluid from spreading. The pattern forming region is formed after the fluid has been ejected so that the arbitrary pattern is formed in the fluid corresponding to the pattern-forming region. The treatment is one in which banks for preventing the fluid from flowing out are formed around the pattern-forming region. The method also includes removing the banks following the formation of the pattern.
申请公布号 US6877853(B2) 申请公布日期 2005.04.12
申请号 US20030445621 申请日期 2003.05.27
申请人 发明人
分类号 B41J2/01;H01L21/00;H01L21/3205;H01L21/768;H01L51/00;H01L51/40;H05K3/12;(IPC1-7):B41J2/01;B41J2/17 主分类号 B41J2/01
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