Ion implanting apparatus for manufacturing semiconductor devices,申请号KR20020057188-传众专利搜索

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发明名称	Ion implanting apparatus for manufacturing semiconductor devices
摘要
申请公布号	KR100481861(B1)	申请公布日期	2005.04.11
申请号	KR20020057188	申请日期	2002.09.19
申请人		发明人
分类号	H01L21/265;G21K5/10;H01J37/09;H01J37/317;(IPC1-7):H01L21/265	主分类号	H01L21/265
代理机构		代理人
主权项
地址

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