| 摘要 |
FIELD: lithography. ^ SUBSTANCE: lithographic device has support for sample, mask, radiation source which radiates within extreme UV spectral range, optic device for collecting and transmitting radiation to mask and optic aid for reducing the image and projecting reduced image to sample. Lithographic device has multilayer mirrors. Any mirror has substrate and set of alternating layers of first and second materials. First material has atomic number to be higher than atomic number of second one. Thickness of pairs of adjacent layers has to be monotonous function of depth in set. The depth is calculated relatively free surface of set. Radiation source has at least one solid target which target when interacting with laser beam focused onto one of target's surfaces, emits extreme UV-radiation from other surface. ^ EFFECT: optimal usage of extreme UV-radiation; widened spectral band of mirrors; reduced thermal deformation of mirrors. ^ 19 cl, 15 dwg |
