发明名称 |
Photo-chemical remediation of Cu-CMP waste |
摘要 |
A photo-chemical remediation of Cu-CMP waste streams basically includes the following acts: adding photo-catalyst particles into waste streams containing copper ions and organic pollutants and exposing the waste streams to UV light or sunlight to make copper ions become deposited on surfaces of the photo-catalyst particles. Whereby, the copper ions are removed from the waste streams. Meanwhile, organic and inorganic pollutants are decomposed by the photolysis capability of the photo-catalyst to make the waste streams dischargable within environmental standards to the environment.
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申请公布号 |
US2005072742(A1) |
申请公布日期 |
2005.04.07 |
申请号 |
US20030678415 |
申请日期 |
2003.10.03 |
申请人 |
LI YUZHUO;KELEHER JASON;GAO NING |
发明人 |
LI YUZHUO;KELEHER JASON;GAO NING |
分类号 |
C02F1/30;C02F1/32;C02F1/68;C02F1/70;C02F1/72;(IPC1-7):C02F1/32 |
主分类号 |
C02F1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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