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发明名称
Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using the same
摘要
申请公布号
KR100481008(B1)
申请公布日期
2005.04.07
申请号
KR20020030999
申请日期
2002.06.03
申请人
发明人
分类号
H01L21/205;C23C16/44;C23C16/452;C23C16/455;F28D17/00;(IPC1-7):H01L21/205
主分类号
H01L21/205
代理机构
代理人
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