发明名称 FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor of a novel structure capable of an improvement of mobility, an increase of a drive current, and of low power consumption by forming a channel region of a novel structure, and to provide its manufacturing method. SOLUTION: The field effect transistor is formed on a substrate, and includes a gate electrode, a source region, a drain region, a channel region disposed in between the source region and the drain region, and at least two or more of moving passages of carriers moving through the channel region. In the field effect transistor, the channel region has a mesh-like structure. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005093664(A) 申请公布日期 2005.04.07
申请号 JP20030324401 申请日期 2003.09.17
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KAWASHIMA YOSHIO;TAKAGI TAKESHI;SORADA HARUYUKI;INOUE AKIRA
分类号 H01L29/06;H01L21/8238;H01L27/092;H01L29/78;(IPC1-7):H01L29/78;H01L21/823 主分类号 H01L29/06
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