| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for treating a substrate capable of effectively removing organic substances remaining on the substrate while keeping the total cost thereof at a low level. SOLUTION: This substrate treatment apparatus takes out the substrates W to be treated one by one from a cassette 10 wherein a plurality of substrates W are housed, and comprises an indexer 11 for carrying the treated substrate W into the cassette 10 again; a pair of front side cleaning portions 15 for cleaning the front side of the substrate W with removing liquid; a pair of back side cleaning portions 16 for cleaning the back side of the substrate W with pure water; a reversing portion 18 for reversing the substrate W so that the substrate W can assume a state that the front side thereof faces upward and a state that the back side thereof faces upward; and a transfer portion 14 composed of a pair of transfer units 12, 13 for transferring the substrate W between and among an indexer 11, the front side cleaning portions 15, the back side cleaning portions 16, and the reversing portion 18. COPYRIGHT: (C)2005,JPO&NCIPI
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