发明名称 SEMICONDUCTOR INSPECTION APPARATUS, AND WAFER FOR USE THEREIN
摘要 PROBLEM TO BE SOLVED: To solve problems of the increase of the number of workpiece types and the increase of cost in a conventional burn-in method wherein a dedicated burn-in board is required for finished good inspection, a dedicated probe card is required for each workpiece type for inspection with the workpieces on a wafer, and dedicated burn-in circuits and patterns for the burn-in of each of the transistors. SOLUTION: In this semiconductor inspection apparatus, a wafer is placed in a fluid and pressure is applied to the fluid, so that mechanical stresses are impressed on all transistors. In this way, a nearly disconnected part in the transistor is completely destroyed by the stress, and an early-stage failure can be eliminated. A dedicated burn-in board or a dedicated probe card is not required for each workpiece type, and a conventional dedicated burn-in circuit is not required. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005093821(A) 申请公布日期 2005.04.07
申请号 JP20030326692 申请日期 2003.09.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KURAMOCHI MASAHIRO;OISHI HIDEO
分类号 G01R31/26;G01R31/30;H01L21/66;H01L21/822;H01L27/04;(IPC1-7):H01L21/66 主分类号 G01R31/26
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