LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

摘要

A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder comprising a plurality of first protrusions the distal ends thereof defining a first contact surface for contacting a substrate, said substrate holder provided with clamping means for clamping the substrate against said first contact surface; and a projection system for projecting the patterned beam onto a target portion of the substrate. The substrate holder comprises a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting said substrate, wherein said second protrusions are arranged so that said second contact surface is substantially coinciding with said first contact surface when the substrate is clamped against said first contact surface en so that said wafer is separated from said first contact surface when the substrate is not clamped against said first contact surface.