| 摘要 |
PROBLEM TO BE SOLVED: To exclude an adverse influence on exposure processing by a pellicle, thereby accurately projecting a circuit pattern on a substrate. SOLUTION: An optical flux is obliquely incident on a pattern face of a reticle R existing across a pellicle P, and reflected light is detected to measure the position of the optical axis direction of the exposed light of the pattern face (3A, 3B). The detected light is outputted which is obliquely incident on this pellicle at a predetermined angle, and an amount of an offset between a first reflected light caused when the detected light enters into the pellicle and second reflected light caused when the detected light entered into the pellicle is exited outside the pellicle is detected (3C), and a measurement value at a position in the optical axis direction is corrected based on the detected amount of the offset. COPYRIGHT: (C)2005,JPO&NCIPI
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