发明名称 LAYOUT SYSTEM, TEMPLATE GENERATION SYSTEM, LAYOUT PROGRAM, TEMPLATE GENERATION PROGRAM, LAYOUT METHOD, AND TEMPLATE GENERATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a layout system suitable for reflecting a correction result of a layout to improve scalability. <P>SOLUTION: A correction is carried out to layout result data, and layout correction information showing the correction content of the layout is registered in a correction information registration DB 20. In relation to a layout element in the correction layout result data, a layout template is formed by correlating an arrangement position of the layout element in a layout region 400 with likelihood of the layout element based on the layout correction information of the registration DB 20. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005092865(A) 申请公布日期 2005.04.07
申请号 JP20040203088 申请日期 2004.07.09
申请人 SEIKO EPSON CORP 发明人 YAMADA SATOSHI;NAGAHARA ATSUJI
分类号 G06F17/21;G06T11/60 主分类号 G06F17/21
代理机构 代理人
主权项
地址