发明名称 FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for depositing a DLC (Diamond Like Carbon) film by a CVD method on a surface of a recording medium in order to protect the recording medium such as an optical disk and a magnetic tape. SOLUTION: In a film deposition device having a first electrode and a second electrode facing the first electrode, plasma is generated between the first and second electrodes by applying the electromagnetic energy with a plurality of frequencies combined to the first electrode, raw gas is activated by the plasma to deposit a film on a base body in the film deposition method. A dense film of high hardness and adhesion with less pin holes can be deposited thereby. In addition, film deposition can be performed with high-density plasma, and high-speed film deposition can be realized. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005089865(A) 申请公布日期 2005.04.07
申请号 JP20040297237 申请日期 2004.10.12
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 HAYASHI SHIGENORI;ITO KENJI;YAMAZAKI SHUNPEI
分类号 C23C16/509;G11B5/85;(IPC1-7):C23C16/509 主分类号 C23C16/509
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